Zero-Dimensional Modeling of an Ar/CHF3/CF4 Gas Discharge in an Inductively Coupled Plasma Device

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dc.contributor.author장충석-
dc.date.accessioned2013-03-15T16:13:51Z-
dc.date.available2013-03-15T16:13:51Z-
dc.date.created2012-02-06-
dc.date.issued1997-
dc.identifier.citationBull, Kor. Phys. Soc., v., no., pp.140 - 140-
dc.identifier.urihttp://hdl.handle.net/10203/121143-
dc.languageKOR-
dc.titleZero-Dimensional Modeling of an Ar/CHF3/CF4 Gas Discharge in an Inductively Coupled Plasma Device-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage140-
dc.citation.endingpage140-
dc.citation.publicationnameBull, Kor. Phys. Soc.-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor장충석-
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PH-Conference Papers(학술회의논문)
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