High-Performance Electroplated Solenoid-Type Integrated Inductor (SI2) for RF Applications Using Simple 3D Surface Micromachining Technology
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chul-Hi Han | ko |
| dc.date.accessioned | 2013-03-15T06:07:43Z | - |
| dc.date.available | 2013-03-15T06:07:43Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1998-12 | - |
| dc.identifier.citation | IEDM, pp.6 - 9 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/116883 | - |
| dc.language | English | - |
| dc.publisher | IEDM | - |
| dc.title | High-Performance Electroplated Solenoid-Type Integrated Inductor (SI2) for RF Applications Using Simple 3D Surface Micromachining Technology | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000078581800126 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 6 | - |
| dc.citation.endingpage | 9 | - |
| dc.citation.publicationname | IEDM | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Fransisco | - |
| dc.contributor.localauthor | Chul-Hi Han | - |
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