Impact of Plasma Charging Damage and Diode Protection on Scaled Thin Oxide
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hyung-Cheol Shin | - |
| dc.date.accessioned | 2013-03-14T16:31:33Z | - |
| dc.date.available | 2013-03-14T16:31:33Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1993 | - |
| dc.identifier.citation | IEDM Technical Digest, v., no., pp.467 - 470 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/110779 | - |
| dc.language | ENG | - |
| dc.title | Impact of Plasma Charging Damage and Diode Protection on Scaled Thin Oxide | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 467 | - |
| dc.citation.endingpage | 470 | - |
| dc.citation.publicationname | IEDM Technical Digest | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Hyung-Cheol Shin | - |
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