Determination of Work Function of Graphene under a Metal Electrode and Its Role in Contact Resistance

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dc.contributor.authorSong, Seung Minko
dc.contributor.authorPark, Jong Kyungko
dc.contributor.authorSul, One Jaeko
dc.contributor.authorCho, Byung Jinko
dc.date.accessioned2013-03-12T17:13:52Z-
dc.date.available2013-03-12T17:13:52Z-
dc.date.created2012-10-09-
dc.date.created2012-10-09-
dc.date.issued2012-08-
dc.identifier.citationNANO LETTERS, v.12, no.8, pp.3887 - 3892-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10203/102969-
dc.description.abstractAlthough the work function of graphene under a given metal electrode is critical information for the realization of high-performance graphene-based electronic devices, relatively little relevant research has been carried out to date. In this work, the work function values of graphene under various metals are accurately measured for the first time through a detailed analysis of the capacitance-voltage (C-V) characteristics of a metal-graphene-oxide-semiconductor (MGOS) capacitor structure. In contrast to the high work function of exposed graphene of 489-5.16 eV, the work function of graphene under a metal electrode varies depending on the metal species. With a Cr/Au or Ni contact, the work function of graphene is pinned to that of the contacted metal, whereas with a Pd or Au contact the work function assumes a value of similar to 4.62 eV regardless of the work function of the contact metal. A study of the gate voltage dependence on the contact resistance shows that the latter case provides lower contact resistance.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectQUANTUM CAPACITANCE-
dc.subjectLARGE-AREA-
dc.subjectTRANSISTORS-
dc.subjectMICROSCOPY-
dc.subjectDEPOSITION-
dc.subjectQUALITY-
dc.subjectDEVICES-
dc.subjectFILMS-
dc.titleDetermination of Work Function of Graphene under a Metal Electrode and Its Role in Contact Resistance-
dc.typeArticle-
dc.identifier.wosid000307211000002-
dc.identifier.scopusid2-s2.0-84864688450-
dc.type.rimsART-
dc.citation.volume12-
dc.citation.issue8-
dc.citation.beginningpage3887-
dc.citation.endingpage3892-
dc.citation.publicationnameNANO LETTERS-
dc.identifier.doi10.1021/nl300266p-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorSul, One Jae-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorGraphene-
dc.subject.keywordAuthorwork function-
dc.subject.keywordAuthorcontact resistance-
dc.subject.keywordAuthorcapacitance-voltage-
dc.subject.keywordAuthorflat band voltage-
dc.subject.keywordPlusQUANTUM CAPACITANCE-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordPlusMICROSCOPY-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusQUALITY-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusFILMS-
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