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Showing results 156581 to 156600 of 279386

156581
Plasma device and substrate board treatment

Chang, Hong-Young; Lee, Jinwon, 2017-04-12

156582
Plasma display panel and low temperature fabrication method thereof

배병수, 2011-01-11

156583
Plasma display panel with Ne+N-2 gas-mixture discharges

Choi, Kyung Cheol; Baek, BJ; Tae, HS; Park, HD, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.50, pp.1440 - 1444, 2003-06

156584
Plasma Doping Strategy for Few-layer Transition Metal Dichalcogenides by Self-assembled Protective Nanostructures

Yim, Soonmin; Jung, Yeon Sik, 제23회 한국 반도체 학술대회, 한국반도체학회, 2016-02-24

156585
Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor devices

Cho, Won-ju; Im, Kiju; Ahn, Chang-Geun; Yang, Jong-Heon; Oh, Jihun; Baek, In-Bok; Lee, Seongjae, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.22, no.6, pp.3210 - 3213, 2004-11

156586
Plasma Effects on Human Liver Cancer Cells

김대연; 송석현; 김미나; 신현정; 권보미; 김단비; 문세윤; et al, 대한기계학회 2008년도 바이오공학부문 춘계학술대회, 대한기계학회, 2008-05-23

156587
Plasma effects on subcellular structures

Gweon, Bo-Mi; Kim, Dae-Yeon; Kim, Dan-Bee; Jung, Hee-Soo; Choe, Won-Ho; Shin, Jennifer Hyunjong, APPLIED PHYSICS LETTERS, v.96, no.10, 2010-03

156588
Plasma Enhanced Atomic Layer Deposition of SrTiO3 Thin Films Using Sr(DPM)2 and TTIP

KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2004-02-01

156589
Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.107 - 109, 2004-02-01

156590
Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

KANG SANG WON, Atomic Layer Deposition (ALD) 2004, pp.0 - 0, 2004-08-01

156591
Plasma enhanced atomic layer deposition of transition metal nitrides (Invited talk)

Kang, Sang-Won, Atomic Layer Deposition conference, ALD, 2001-05

156592
Plasma Enhanced Chemical Vapor Deposition of TiO2 Films on Powders in a Circulating Fluidized Bed Reactor

Kim, Sang Done, Int. Symp. on Chemical Reaction Engineering, pp.76 - 77, 2006

156593
Plasma enhanced chemical vapor deposition of TiO2 films on silica gel powders at atmospheric pressure in a circulating fluidized bed reactor

Kim, Gook Hee; Kim, Sang Done; Park, Soung Hee, CHEMICAL ENGINEERING AND PROCESSING, v.48, no.6, pp.1135 - 1139, 2009

156594
Plasma enhanced chemically vapor deposited aluminum oxide films as a new etch mask material for microelectronic fabrication

이원종, KOREAN APPLIED PHYSICS, v.7, no.4, pp.289 - 296, 1994-04

156595
Plasma Enhanced CVD 방법으로 제조한 $C_(1-x)$ $N_x$ nanotube에 Co, P를 doping한 촉매의 미세구조와 알칼리 $NaBH_4$ 용액에서의 수소발생특성에 관한 연구 = A study on the microstructures of catalysts doping Co, P components in $C_(1-x)$$N_x$ nanotubes prepared by PECVD and their hydrogen generation properties by hydrolysis of $NaBH_4$link

송철옥; Song, Cheol-Ock; et al, 한국과학기술원, 2008

156596
Plasma enhanced CVD 방법으로 제조한 $C_{1-X}N_X$ nanotubes의 구조변화에 따른 수소저장특성에 관한 연구 = A study on the hydrogen storage porperty of $C_{1-X}N_X$ nanotubes prepared by PECVD with their nano-structural changelink

김현석; Kim, Hyun-Seok; 강정구; Kang, Jeung-Ku; et al, 한국과학기술원, 2006

156597
Plasma equilibrium reconstruction for real-time control using artificial neural network in KSTAR

Joung, S; Kwak, Sehyun; Ghim, Young chul, KSTAR Conference 2016, National Fusion Research Institute, 2016-02-24

156598
Plasma etched vertically aligned carbon nanotube embedded polyurethane surface for precision semiconductor wafer polishing

Kang, Sukkyung; Jung, Jihoon; Ryu, Hyunjun; Won, Dongyeon; Kim, Sanha, 2023 MRS Fall Meeting & Exhibit, Material Research Society(MRS), 2023-11-28

156599
Plasma Etching and Microwave Discharge

장충석, 한국물리학회 플라즈마 분과 제2회 학술발표회 (논문집), pp.123 - 148, 1987

156600
Plasma Etching Antenna Effect on Oxide-Silicon Interface Reliability

H. Shin; C. Hu, SOLID-STATE ELECTRONICS, v.36, no.9, pp.1356 - 1358, 1993-02

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