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Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; et al, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05 |
Poly(arylene ether)s with Low Refractive Indices: Poly(biphenylene oxide)s with Trifluoromethyl Pendant Groups via a Meta-Activated Nitro Displacement Reaction Kim, Sun Dal; Ka, Duyoun; Chung, Im Sik; Kim, Sang Youl, MACROMOLECULES, v.45, no.7, pp.3023 - 3031, 2012-04 |
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