Browse by Subject B dopants

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1

Ab initio study of boron segregation and deactivation at Si/SiO2 interface

Oh, Young-Jun; Hwang, Jin-Heui; Noh, Hyeon-Kyun; Bang, Jun-Hyeok; Ryu, Byung-Ki; Chang, Kee-Jooresearcher, MICROELECTRONIC ENGINEERING, v.89, pp.120 - 123, 2012-01

2

First-principles study of the segregation of boron dopants near the interface between crystalline Si and amorphous SiO2

Oh, Young-Jun; Noh, Hyeon-Kyun; Chang, Kee-Jooresearcher, PHYSICA B-CONDENSED MATTER, v.407, no.15, pp.2989 - 2992, 2012-08

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